Single Wafer Cleaner SU-3200

SU-3200 Single Wafer Cleaning System

Features

Super Clean Chambers feature APAC* cleaning technology.

  • Volume of chamber interior is about one-third of a previous model.
  • Maximized atmosphere replacement performance ensures ultra-high cleanliness.
  • A new developed air balance guide (ABG) ensures uniform FFU downflow.
  • Proprietary air protection nozzle (APN) technology for watermark-free drying.
  • Proprietary advanced splash protection (ASP) technology minimizes chemical splash to ensure a clean wafer processing environment.
*APAC: Advanced Process Atmosphere Control. Screen's ultra-clean chamber technology.

High productivity

  • Stacked design combines twelve chambers in four three-level towers.
  • Accelerated transport system provides throughput of up to 800 WPH.
  • Greater productivity per unit area.

Versatile chemical supply system

  • Pair configuration of the chambers and fluid units plus the fluid units' tray construction facilitate specification changes and maintenance.
  • The SU-3200's chemical supply system is at the rear to improve processing control by minimizing the distance between the chemical supply source and the wafer. The layout can be freely adjusted to suit processing needs.
  • The SU-3200 is available with either Dynamic Direct Injection (DDI) or cabinet-type chemical supply system to best suit your needs.
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